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Information × Registration Number 0203U008035, 0100U003304 , R & D reports Title Process investigation of plasma-chemical coating formation under exposure of condensation surface to charged particles popup.stage_title Head Sagalovich V., Registration Date 10-04-2003 Organization Kharkov National University named after V.N.Karazin popup.description2 Subject of investigation: processes of coatings formation of different structure at vacuum-arc deposition and reactive magnetron sputtering in an atmosphere of reaction gas. Objectives: definition of influence of flows of the charged particles of different energy on the plasma-chemical processes of coatings formation. Method of investigation: the theoretical analysis of processes of interaction of reaction gas with a surface of sputtering of a target and condensation of coatings, experimental research of formation of coatings of different structure using the methods of reactive magnetron sputtering and vacuum-arc deposition. The theoretical research of processes of interaction of reaction gas with a surface of a target and with a surface of condensation using the method of reactive magnetron sputtering of coatings "metal-nonmetal" is carried out. The dependences between parameters of sputtering of a target and plasma-chemical processes of formation on its surface of connections "metal-nonmetal" and formation of coatings of the appropriate structure in an analytical kind are received. It's established, that changes of growth speed at vacuum-arc deposition of coatings from titanium in the environment of nitrogen has the place in the field of pressure values, in which there is a transition from formation of coatings from alpha-Ti to coatings TiN through the geterophase area. Geterophase structure of coatings is realized at the ratio between a flow of atoms of titanium and nitrogen within the limits of 0,1-10. By the carried out researches it is established, that the reaction plasma-chemical formation of connections titanium with nitrogen in the investigated conditions has not kinetic restrictions, so, their structure must be affected only by concentration ratio of reactants on a surface of growth of a coating. The basic influence of energy and density of ions was showed in a plane connected by radiating processes and processes adsorption. The investigation results were used in definition of parameters for optimization of reactive magnetron sputtering and vacuum-arc deposition processes to be implemented in technological developments and further investigations focused on obtaining of coatings with given properties. Product Description popup.authors popup.nrat_date 2020-04-02 Close