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Information × Registration Number 0214U005389, 0114U001918 , R & D reports Title Study of nanostructure wear-resistant nitride coatings deposited from vacuum-arc filtered plasma with using of powder titanium and chromium based cathodes popup.stage_title Head Strel'nitskij Vladimir Evgenievich, Доктор фізико-математичних наук Registration Date 19-12-2014 Organization National Science Center "Kharkiv Institute of Physics and Technology popup.description2 Report on Research Work: 35 P., 13 Figs., 2 Tables, 33 References. Object of research - the process of vacuum arc coatings deposition using multi-component powder cathodes. Purpose - experimental and theoretical study of the synthesis, structure and properties of nitride coatings deposited from filtered vacuum arc plasma source with powder cathodes (based on Ti and Cr) when applying high voltage pulse bias potential on the substrate. Research methods - X-ray fluorescence analysis, X-ray diffraction, nanoindentation, mathematical modeling of the formation of residual stresses. A study of filtered vacuum arc plasma source operation with experimental samples of powder composite cathodes of Ti-Si, Ti-Cr-Si and Ti-Cr-Si-C systems was carried out. Found that in normal mode of operation the plasma source having problems with the stability of vacuum arc discharge due to the occurrence of defects on the surface of the cathode and so reduced velocity of the cathode spot movement. Using a new method of feeding the reaction gas to the vacuum chamber through the source of filtered vacuum-arc plasma allowed achieve stable operation of the source with powder cathodes during process of the nitride coatings deposition. Using theoretical calculations based on the concept of nonlocal thermoelastic peak shows that the decrease in deposition temperature leads to a significant increase of internal residual stresses in the coating. Established that the deposition in a pulse substrate potential mode causes much less stresses level in the coating than deposition in a DC substrate potential mode at the same temperature. With the use of a new method of gas supply and multi-component powder composite cathode and under the high voltage pulse bias potential on the substrate the coatings of Ti-Si-N system were deposited. The influence of deposition parameters on the elemental composition, structure, and properties of coatings was searched. Established that the silicon content in coatings may be significantly lower than that in the cathode. Increasing silicon content contribute: exclusion the argon from the working gas composition, reduction in the amplitude of the pulse substrate bias potential below 1 kV, reduction of the nitrogen pressure during coating deposition to the level of (3-5)·10-2 Pa. The conditions that allow synthesize nanostructured coatings with high hardness were revealed. After the analysis of the results and discussion with Russian partner the requirements for cathodes parameters were determined that are necessary to synthesize the multi-component nitride coatings based on Ti and Cr with significantly improved properties. The requirements compliance will allow more flexibility when adjust the deposition process parameters without deterioration of the stability of the filtered plasma source, in particular - reduce nitrogen pressure during deposition, which will form a coating with optimum nitrogen and silicon content. Realization of these requirements and synthesis of the coatings are planned for the second year of studies. Product Description popup.authors Аксьонов Дмитро Сергійович Васильєв Володимир Васильович Калініченко Олександр Іванович Лучанінов Олександр Андрійович Маринін Володимир Григорович Решетняк Олена Миколаївна Стрельницький Володимир Євгенійович Толмачова Галина Миколаївна popup.nrat_date 2020-04-02 Close
R & D report
Head: Strel'nitskij Vladimir Evgenievich. Study of nanostructure wear-resistant nitride coatings deposited from vacuum-arc filtered plasma with using of powder titanium and chromium based cathodes. (popup.stage: ). National Science Center "Kharkiv Institute of Physics and Technology. № 0214U005389
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