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Information × Registration Number 0216U005380, 0111U001941 , R & D reports Title Investigation of physical processes in low-temperature plasma of high-frequency and arc discharges with magnetic fields in gases and metal vapors popup.stage_title Head Borisenko Anatolii Hrygorovych, Registration Date 22-01-2016 Organization Institute For Nuclear Research Of National Academy Of Sciences Of Ukraine popup.description2 This paper presents the results of experimental studies of physical processes in high and low-temperature plasma arc with magnetic fields in gases and vapors metals. The first section provides results on the influence of the general characteristics of the discharge and plasma helikonnoho source with planar antenna and the development and manifestations inherent to such a source of intense bass instability factors such as the shape and size of excitatory planar antenna and the length of the discharge chamber of the source. Established that the reduction of the length of the discharge chamber to source 20% of the picture displays intense bass instability enriched excitement in addition to basic mode oscillation modes with dual and triple frequency. Comparative studies of spatial distribution of high-frequency magnetic field excited in plasma helikonniy "planar" and "loop" induction antennas given in the second chapter. In helikonnomu discharge of linear excitation revealed that the approach leading to the workpiece induction antenna discharge occurs in the non-resonant conditions. Discovered and investigated the instability of the homogeneous distribution of plasma concentrations along the linear antenna that the excess of critical parameters category. The third section is an arc. Arc vapor discharge Cu at currents up to 20 A enables deposition of copper films at a speed of 18 mm / h. Using 3 working materials, Ti, Ni, Cu, been shown to be dependent arc discharge vapor material of the anode is able to generate bezkrapelni and highly ionized flows of metal plasma and provide the growth rate of precipitable metal films that are close to the respective capabilities plasma sources based on the vacuum arc discharge vapor in the cathode material. At discharge vapor fraction of copper ions in the stream does not exceed 40%. In the arc discharge in vapors of various metals, energy ions expressed in eV, do not exceed the values ??of voltage drop at discharge. For discharge in inverted cylindrical magnetron DC argon with admixtures of oxygen shown character hysteresis voltage-current characteristics (VCC) level and hysteresis intensity emission spectra lines of plasma components reactive gas stream. There CVC hysteresis and hysteresis intensity of emission lines of the plasma component spectra environment (Ar, O2, atoms sputtered from the cathode Ti). Measurement of emission lines of plasma components (Ti, O2, Ar) category revealed the connection between the flow of oxygen, specific points on the CVC discharge in magnetron cathode and titanium composition precipitable titanium oxide film. In the fourth chapter shows the electrical, spectral, thermodynamic and transport properties of dense multi-pulse plasma arc. The physical processes responsible for the formation and structure of the discharge channel component composition arc plasma of electrical discharges in gases and liquids, the influence on the electrical component composition, thermodynamic and transport properties of this plasma. Established that on the process of electrical discharges in liquids significantly affect disturbances that are made to channel bits during their formation. Most favorable conditions for the development of turbulent mixing taking place on the surface of the discharge channel in the active phases of plasma leakage current. Calculations electrical, thermodynamic and transport properties of dense multicomponent plasma arc. Plasma parameters can be measured by a series of boundary lines or not subject to the effect of "nerealizatsiyi." You can determine the concentration of electrons on expansion Stark H? line at Ne <1019 cm-3, and H? line at Ne <1018sm-3. Measure the maximum temperature observations on beam intensity maximum emission lines H? reabsorbovanoyi can immediately after discharge from the continuous spectrum. The fifth section is devoted to the physical and technological research of high capacitive discharges. It is shown that by using magnetic fields can not regulate voltage avtozmischennya from 0 V to 1000 V. When the voltage between the electrodes avtozmischennya above -250 in an intensive spraying pereosadzhennya central electrode and the metal atoms. In the spectra of radiation while there are lines that are excited atom materials from which made the active electrode. On the surface of silicon processed under these conditions, using X-ray analysis revealed the same material impurities, indicating pereosadzhennya scattered over the surface of processed samples. Number of impurities increases with voltage avtozmischennya. A mass spectrometric studies of plasma rf discharges in gases halohenovmisnyh and its implications on the plasma chemical etching, printing films materials of different composition. Obtained and processed in the mass spectra discharges in elegaze (SF6), refrigerant-14 (CF4), refrigerant - 218 (C3 F8) and mixtures thereof with oxygen. At discharge refrigerant -14 observed in atomic carbon, which when etching silicon reacts with it to form silicon carbide, which is 5 times reduces the rate of digestion. At discharge C3F8 in the molecules CF2, leading to the formation of PTFE film on a silicon surface (CF2) n. The sixth chapter is devoted teoreretychnym research. Based on the kinetic approach explored the transformation lenhmyurivskoyi waves in transverse electromagnetic wave in turbulent plasma, which is under the influence of high-frequency radiation at a frequency of upper. Found intensity of electromagnetic radiation and its dependence on plasma parameters and field pumping. The results make it possible to offer one of the possible mechanisms of natural radiation from various space objects. Numerical experiment focusing on sylnostrumovyh, wide aperture lens electron beams with plasma space charge, showed that in this case the magnetic focusing only possible because the cloud collapses quickly, so you need to choose the optimum magnetic field to improve focus and minimize geometric aberrations. The presence of plasma lens improves the transport of the electron beam, and reduce his differences due to the additional revenues generated positive ions plasma lens compensating space charge beam. The results of research agree well with experimental data. The research results were presented at international conferences on plasma physics and CF, low-temperature plasma physics, plasma electronics and new methods of acceleration of information and electronic technologies, etc. .. and Ukrainian conferences on plasma physics and CF. The investigations on the subject published 144 works, including 45 in foreign and national refereed journals. Product Description popup.authors Білодуб Анатолій Макарович Вірко Валерій Федорович Вірко Юрій Валерійович Васильчук Богдан Ярославович Войтенко Леонід Михайлович Гладковький Володимир Володимирович Костін Євген Григорович Літовко Ірина Валентинівна Лашкін Володимир Михайлович Міліція Віктор Михайлович Павленко Віктор Миколайович Панченко Володимир Георгійович Петряков Володимир Олексійович Подзірей Юрій Степанович Полозов Борис Павлович. Порицький Павло Віталійович Рокицький Олександр Анатолійович Старчик Павло Денисович Толстих Михайло Юрійович Федорович Олег Антонович popup.nrat_date 2020-04-02 Close