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Information × Registration Number 0217U001665, 0114U000895 , R & D reports Title Plasma Helicon RF Ion Source of High Brihtness for Nanotechnological Aplications and Accelerators. popup.stage_title Head Voznyi Vitalii, Registration Date 15-03-2017 Organization Applied Physics Institute NAS of Ukraine popup.description2 Helicon radio-frequency (RF) ion source with a longitudinal magnetic field is developed. Plasma density and the electron temperature of the source in the absence of a magnetic field are calculated by applying a global theory of plasma RF discharge. Argon ion beam current density extracted from the source is calculated. By applying Comsol software a modeling of RF inductive plasma source is fulfilled and plasma parameters were calculated as a function of the source dimensions, argon pressure, RF power and an external magnetic field. Numerical calculations of the local RF power absorption in the bulk of the plasma layer in inhomogeneous magnetic field are made in relation to the entry angle of the magnetic field in the plasma, neutral gas pressure, plasma density, external excitation frequency. A precision instrument to measure ion beam emittance is design for the ion beam brightness measurement. The characteristics of ion source are measured with the aim to produce a helium ions beam; the optimum conditions of the ion source operation are found. Product Description popup.authors Алексенко Олег Володимирович Возний Віталій Іванович Лифар Іван Миколайович Марченко Андрій Миколайович Садовий Сергій Олексійович Шульга Дмитро Петрович popup.nrat_date 2020-04-02 Close