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Information × Registration Number 0219U003234, 0116U002531 , R & D reports Title Physical processes in discharge and complex plasma for technological application popup.stage_title Head Anisimov Igor J., Registration Date 29-01-2019 Organization Taras Shevchenko Kiev University popup.description2 A generalized model of shock dissociation of solvated organochlorine molecules is proposed.The simulation studies the heating and coagulation of dust particles in a plasma stream that expands into a rarefied neutral gas.The parameters of the arc discharge plasma between the asymmetric one-component copper and nickel or copper and composite Ag-Ni electrodes have been experimentally studied.Experimental properties of plasma of wide aperture rotating sliding discharge have been investigated.The generation of silver nanoparticles in a plasma-liquid system with a non-independent discharge supported by a rotary sliding discharge is studied.Electrical properties and emission spectra of microparticles plasma are investigated.Influence of plasma processing on growth of mycelium of higher fungi and spore colonies is investigated.The kinetics of formation of nitrogen oxides and settling of excited levels of oxygen and nitrogen molecules have been studied using simulation.For the first time a simulation of chemical and plasmochemical kinetics of ethyl alcohol reformation was carried out.The development of plasma-beam discharge in helium was studied with the help of the original software package.The simulation of the initial stage of excitation of the annular wave in the plasma is performed by a resonant and nonresonant sequence of relativistic electronic clusters. Product Description popup.authors Анісімов І. Борецький В. Веклич А. Веремій Ю. Гамазін Д. Клешич М. Коломієць О. Кравченко О. Лебідь А. Левада Г. Мартиш Є. Марущак І. Мурманцев О. Недибалюк О. Ольшевський С. Федірчик І. Фесенко С. Черняк В. Юхименко В. Юхименко К. popup.nrat_date 2020-04-02 Close
R & D report
Head: Anisimov Igor J.. Physical processes in discharge and complex plasma for technological application. (popup.stage: ). Taras Shevchenko Kiev University. № 0219U003234
1 documents found

Updated: 2026-03-26