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Information × Registration Number 0220U101168, 0119U100328 , R & D reports Title Investigation of properties of low-temperature gas-discharge plasma for technological applications. popup.stage_title Head Anіsіmov Іgor Oleksіyovich, Доктор фізико-математичних наук Registration Date 04-01-2020 Organization Taras Shevchenko National University of Kyiv popup.description2 The object of study is low-temperature gas discharge plasma for technological applications. The purpose of the work is to study the properties of low-temperature gas-discharge plasma for technological applications. Research Methods - Optical emission / absorption spectroscopy, calorimetry, mass spectrometry and gas chromatography computer simulation using PIC / MCC method, using ZDPlasKin codes and PLS source code. Plasma activation of synthesis of optically active medium from optically inactive reagents was experimentally implemented. The effect of plasma treatment on the growth of higher and lower fungi has been experimentally studied. Properties of plasma microarray in the CO2 stream depending on the installation parameters are investigated. A system for the elimination of persistent organochlorine toxicants in the liquid phase has been developed. A new algorithm for calculating plasma temperature in PIC codes is proposed and implemented. Physical and mathematical models and a program for modeling the deposition of nanoparticles on a substrate have been developed. The technique of spectroscopic diagnostics of electric arc plasma with impurities of metal vapor is proposed.  Product Description popup.authors Anіsіmov Іgor O. Vakula Yuriy O. Kolomiets Oksana V. Kostyukevich Oleksandr M. Levada Galyna I. Maruschak Ivan S. Stepkina Tetyana G. Fedorchenko Mykola I. Tsymbalyuk Oleksandr M. Iukhymenko Vіtalіy Vasilovich popup.nrat_date 2020-04-02 Close