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Information × Registration Number 0225U003769, (0122U001695) , R & D reports Title Physical bases of technological applications of low-temperature plasma popup.stage_title Обробка результатів моделювання та експериментів і вироблення рекомендацій. Head Anisimov Ihor О., Доктор фізико-математичних наук Registration Date 15-08-2025 Organization Taras Shevchenko National University of Kyiv popup.description1 Research of physical processes in discharge and complex plasma of different types with the purpose of its further application for various technological needs. popup.description2 Relevance: the physical foundations of possible applications of low-temperature plasma have been developed: deposition of nanoparticle films by a plasma jet; increasing the erosion resistance of arc discharge electrodes; building accelerators on wake waves excited by electron bunches; destroying pests of various nature by plasma treatment of seeds; creating a plasma source for plasma-chemical applications. Purpose: Study of physical processes in discharge and complex plasma of various types with the aim of its further application for various technological needs. Main tasks: the deposition of nanoparticles on a flat solid surface using plasma jets has been studied; the thermodynamic state of inhomogeneous electric arc plasma with metal vapor impurities has been studied; the effect of an external magnetic field on the excitation of wake fields in plasma by a resonant sequence of relativistic electron bunches has been studied; the dominant mechanism of the transverse discharge plasma action on the treated surface was clarified; the plasma parameters of the secondary (non-independent) atmospheric pressure discharge supported by a gas-dynamic rotating sliding discharge were investigated. Ideas and hypotheses: We have previously shown that dust particles in a plasma jet can heat up to high temperatures, exchange energy with plasma and significantly affect the dynamics of plasma jets. Since these processes depend on the size of dust particles, it is important to study these processes for a mixture of dust particles of different sizes for the development of film deposition technology. The use of optical emission and/or absorption spectroscopy methods to study the thermodynamic state of the electric arc plasma in different discharge operating modes will allow (in the case of its equilibrium) to determine the content of metal vapors in its composition and, as a result, to assess the electroerosion resistance of composite electrodes. Product Description popup.authors Bilyk Leonid M. Kolomiets Oksana V. Kostiukevych Oleksandr M. Lendel Leonid М. Levada Halyna І. Marushchak Ivan S. Teleha Volodymyr M. Tsymbaliuk Oleksandr M. Yukhymenko Vitalii V. popup.nrat_date 2025-08-15 Close
R & D report
Head: Anisimov Ihor О.. Physical bases of technological applications of low-temperature plasma. (popup.stage: Обробка результатів моделювання та експериментів і вироблення рекомендацій.). Taras Shevchenko National University of Kyiv. № 0225U003769
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Updated: 2026-03-24
