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Information × Registration Number 2111U001254, Article popup.category Thesis Title popup.author popup.publication 01-01-2011 popup.source_user Сумський державний університет popup.source http://essuir.sumdu.edu.ua/handle/123456789/20843 popup.publisher Видавництво СумДУ Description Nitriding of metals in electron beam generated plasma provides change of ion current density j and ion energy E over a wide range, the constant temperature of a sample being sustained by change of electron beam parameters. Broad (100 cm2) electron beam (5-20 A, 60-500 eV) was generated by electron source with a plasma cathode. 12X18 10 stainless steel was nitrided at 500 during 1 h. Dependences of nitriding layer thickness on j (1,6-6,2 m/cm2), E (100-300 eV), pressure of Ar-N2 gas mixture (1-10 Pa) were obtained. Nitrided layer thickness was measured in cross-sections with the use of microhardness meter and SEM micropictures. The layer thickness decreases with the rate 4-5 microns per 100 eV with E growth and rises from 19 up to 33 microns with j increase. Character of nitriding rate dependence on j contradicts conclusions of the theory concerning restriction of the layer thickness by ion sputtering with j growth. The value of effective diffusion coefficient is an order of magnitude higher than the one known from literary data. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/20843 popup.nrat_date 2025-05-12 Close