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Information × Registration Number 2112U001399, Article popup.category Thesis Title popup.author popup.publication 01-01-2012 popup.source_user Сумський державний університет popup.source http://essuir.sumdu.edu.ua/handle/123456789/35394 popup.publisher Sumy State University Description Layers of intrinsic hydrogenated amorphous silicon (a-Si:H) films were deposited using Gas-Jet Electron Beam Plasma Chemical Vapor Deposition (GJ-EBP-CVD) technique. The optical parameters (refraction index (n), absorption coefficient ( )) and the thickness were determined from the extremes of the interference fringes of transmission spectrum in the range of 500 – 1000 nm using the envelope method and method PUMA. The spectral dependence of the refractive index and absorption coefficient was obtained by varying the substrate temperature (Ts). The optical band gap (Eg) was determined using Tauc method and the estimated values were in range 1.88 – 1.78 eV for various substrate temperatures. The calculated thicknesses for all samples were about 1 micrometer. The film’s deposition rate as a function of the substrate temperature was found. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35394 popup.nrat_date 2025-05-12 Close