Search academic texts

Information × Registration Number 0203U008647, 0102U000798 , R & D reports Title Investigation of the quantum-well states and peculiarities of electron structure, interactions between layers in multilayer nanostructures transition metal-silicon by methods of experimental theoretical magneto-optical and optical spectrometry popup.stage_title Head Makogon Yurij Mykolajovych, Registration Date 19-12-2003 Organization The National Technical University of Ukraine "Kiev Polytechnical Institute"; Institute of Technical Physics popup.description2 They were established regularities of changes of phase composition, structure and optical properties due to interlayer interactions in the multilayer nanodimensional thin film systems 3d-transition metal-silicon. It was established that dimension factor in the multilayer nanodimensional thin film systems Fe/Si/Fe/Si/... leads to essential dependence of the magnetic interaction character between the layers of irons from nominal thickness of the silicon layers. With increasing nominal thickness of the silicon layers from 1 nm to 2 nm interaction between the layers of irons changes from ferromagnetic to antiferromagnetic and again ferromagnetic. The maximum antiferromagnetic interaction between the layers of irons in the multilayer films is observed at nominal significance of the silicon thicknesses order 1,3-1,5 нм. Metastable phase FeSi provides antiferromagnetic interaction between the layers of irons, which spontaneous forms at deposition of the layers and has metallic conductivity. New energy levels in the electron energy spectrum, such named quantum-well states, do not find their imagery in the optical and magneto-optical properties of the Fe/Si/Fe/Si/... multilayer films. Nanodimensional thin film systems Ni/Si/Ni/Si... and Co/Si/Co/Si.. demonstrate superparamagnetic properties, which connect with formation of the silicides NiSi or Co2Si, respectively. In the Fe/Si/Fe/Si/... multilayer films antiferromagnetism is observed at tSi=1,3-1,5 nm, but Ni/Si/Ni/Si... и Co/Si/Co/Si... multilayer films demonstrate superparamagnetic properties at tSi=5,0-10 nm. Silicide formation processes in the Co/Ni/Si(100) system with equal thickness Ni and Co layers at vacuum furnace annealing begin earlier on 100 К (at 670 К), as in the Ni/Si system. In the Co/Ni/Si system at orientations of the silicon substrate (100) and (111) NiSi2 phase forms earlier on 150 К (at 870 К), than in the Ni/Si system. Product Description popup.authors popup.nrat_date 2020-04-02 Close