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Information × Registration Number 0209U010286, 0108U008831 , R & D reports Title Development and introduction of high effective technolody of cleaning of fotorezist of semiconductor and dielectric surface. popup.stage_title Head Virchenko Petr, Registration Date 02-11-2009 Organization The interbranch centre of technologies implementation and transfering "Erydan" popup.description2 Technology which has complementary nature and it is a three-stage is developed in this work, in quality of deleting of fotoresist exceeds modern world achievements . On the first stage take place the primary cleaning of surfaces of semiconductor and dielectric layers from worked fotoresist by their treatment in low temperature high-frequency plasma in a gas environment ., oxygen of тетрафторметану. On the second stage will be realized skrabbing surfaces of layers in water solution of superficially-active matter ( PAIR ) On the third stage is deleting of remaining tape of PAIR together with adsorbed by her on the third stage, but not remote on the previous stages of cleaning, by tailings of fotoresist in oxygen-argon plasma. The developed technology guarantees deleting of worked fotoresist from technological layers after some extreme influences on it. Product Description popup.authors Бездєтко М.Д. Вірченко Є.П. Вірченко П.Т. Ковальчук В.В. Полтавцева І.С. popup.nrat_date 2020-04-02 Close