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Information × Registration Number 0210U000247, 0107U002936 , R & D reports Title Development of multy-magnetron unbalanced sputtering technology for superhard nanostructure coatings popup.stage_title Head Ivashchenko Volodymyr Ivanovych, Registration Date 29-01-2010 Organization Frantzevich Insitute for Materials Science Problems of the Ukranian National Academy of Sciences popup.description2 We have developed and manufactured the installation for multy-magnetron deposition of nanostructure and nanocomposite coatings. Modification of equipment has allowed to carry out ECR plasma activated sputtering. First the nanocomposite coatings were deposited due to reactive sputtering target with a complex of titanium, silicon and graphite. Specifically nanostructured coatings based on TiNC / SiCN has been obtained and studied its the properties. Resuts of studies have showed the extreme dependence of hardness (up to 29 GPa) and elastic modulus (up to 320 GPa) on the content of silicon in target. X-ray studies have indicated the formation of nanocomposite nc-TiNC/a-SiCN. When sputtering B4C target amorphous and nanocrystalline coatings formed at substrate temperatures below 900 0C or more. Installation was used for obtaining nanolayerd Ti/SiC and TiN/SiCN coatings. Period amounted to respectively 17 nm and 5 nm. Number of layers was until 22. In order to improve nanotechnology, to establish mechanisms for the strengthening of nanostructured coatings, and to predict the properties of the films was carried out construction of possible models of the evolution of coatings under the influence of deformation. Based on calculations by FP methods and Tersof empirical potential analyzed the structural and mechanical properties of nanostructured coatings. First modeling the influence of the monoaxial deformation different nanolayerd structures of silicon in the framed of molecular dynamics based on empirical potential has been performed. It has been showed that strengthening coatings in the formation nanolayerd structures is not associated with abnormalities in the density of coatings on the interfaces , and conditioned with mechanisms associated with moving dislocations. First it has been established the possibility of appearing new structures at monoaxial compression in the nanolayerd systems for example a twinning nanolayerd silicon structures in the direction (111), where monoaxial pressure of 25 GPa a new metastable quintuple orthorhombic coordinated silicon structure has been revealed, which becomes stable tetragonal volumetric-formed structure at decompression. Product Description popup.authors І.І. Тімофєєва А.В. Осадча В.М. Гранько В.Ю. Куліковський Л.А. Іващенко Л.А. Грішнова О.К. Порада О.О. Бутенко О.О. Онопрієнко О.О. Ситіков П.Л. Скринський С.М. Дуб Ф.Г. Бутенко popup.nrat_date 2020-04-02 Close