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Information × Registration Number 0210U004180, 0108U009662 , R & D reports Title Modernization of the technological room for pyrolytical processes. Modernization of equipment "Isotron 2M" for low pressure chemical vapor deposition (LP CVD) of the SiGe and Si epitaxial layers. popup.stage_title Head Sidorenko Volodymir Pavlovich, Registration Date 17-03-2010 Organization State Enterprise "Research Institute of Microdevices" STC "Institute for Single Crystals" of NAS of Ukraine popup.description2 The works directed on recovery and modernization of equipment "Izotro-2M" for manufacturing of electronics devices at deposition of silicon and silicon nitride layers at low pressure with using concentrated silane and dichlorsilane gases on wafers of 100 mm in diameter in reactor of furnace have been performed. As a result of modernization the equipment gives possibility to deposit the polycrystalline silicon with various thickness and grow the SiGe and Si epitaxial layers. Product Description popup.authors Євтух Анатолій Антонович Рижков Володимир Михайлович Сидоренко Володимир Павлович popup.nrat_date 2020-04-02 Close