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Information × Registration Number 0211U009090, 0106U003218 , R & D reports Title The interconnection between parameters of gases discharge and characteristics metallic and metalloid thin films at a deposition by ion - plasma methods are research. popup.stage_title Head Therpy Dmitry N., Registration Date 21-06-2011 Organization Donbass State Engineering Academy popup.description2 The object of study: the processes taking place during the formation of thin films and coatings, films and coatings diborides transition metals (Ta, Hf, V, Zr). Objective: To establish the relationship between power characteristics and density of jets of particles (atoms, clusters, ions) and the mechanisms of film growth of metal compounds. On this basis, develop mechanisms and algorithms that would predict the composition, structure and properties of the films. Methods: optical microscopy, vimirennya nano-and microhardness, electron microscopy, elemental analysis and X-ray crystallography, computer modeling by the Monte Carlo. The paper presents results of studies of the films diborides transition metals (tantalum, hafnium, vanadium, and zirconium). The processes of deposition, formation and growth of such films and coatings. In the course of established general regularities relationship between the structural state of the film and its basic properties, primarily mechanical and physical, conducted an analysis of the chemical properties of these coatings. On the basis of the experiments proposed by the main provisions of the mechanism of formation and growth of the films. With the help of Monte Carlo and analytically studied the changes in the characteristics of the deposited films were proposed algorithms to predict the necessary modes of deposition of coatings with preset properties. The investigation of the possibility of using microhardness (PMT-3) to determine the hardness of thin layers. By comparative analysis of the data nanohardness and numerical methods for extrapolating a technique that allows a sufficient degree of accuracy to calculate the hardness of films and coatings from a thickness of 0.4 microns. Product Description popup.authors Дьяченко Юрій Григорович Коновалов Владілен Анатолійович Лаптєв Олександр Михайлович Мінков Олександр Миколайович Петухов Вадим Вікторович Плеханова Лідія Валентинівна Рульов Віктор Іванович Терпій Дмитро Миколайович Ткачов Олексій Іванович popup.nrat_date 2020-04-02 Close