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Information × Registration Number 0212U008802, 0110U004115 , R & D reports Title Design of the proton lithography unit with submicron resolution. popup.stage_title Head Ponomarev Oleksandr, Registration Date 03-01-2013 Organization Applied Physics Institute NAS of Ukraine popup.description2 A proton lithography facility with new probe-forming system is developed where scanning process by a focus beam is carried with electrostatic scanner equipped with a high-speed amplifier. There are automated electronic control system for scanning and programming language for pattern formation of small-scale 3D structures developed. A new exposure chamber is developed. Magnet quadrupole lenses of final focusing system are upgraded. Process of lithography is developed by a focused proton beam. Proton beam formation was theoretically and experimentally studied in a new probe-forming system based on a quadruplet of magnet qualdrupole individually powered. Submicron resolution is attained; this system is shown to have current density three times as much as "Russian Quadruplet" conventional system. Product Description popup.authors Колінько Сергій Володимирович Магілін Дмитро Владиславович Мельник Костянтин Ігорович Мирошніченко Валентин Іванович Пономарьов Артем Олександрович Пономарьов Олександр Георгійович Ребров Володимир Анатолійович Ребров Олексій Володимирович Романенко Олександр Вікторович Чемеріс Олександр Іванович popup.nrat_date 2020-04-02 Close