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Information × Registration Number 0305U003366, 0103U004193 , R & D reports Title Investigation of nano-composite materials synthesis in computer-aided high-current vacuum-plasma systems popup.stage_title Дослідження і розробка методів модифікації поверхні твердого тіла та створення систем сполучення вакуумно-плазмового обладнання з комп'ютером Head Tseluyko O., Bizjukov O., Registration Date 24-03-2005 Organization Kharkov national university named after V.N. Karazin popup.description2 The purpose of the project is experimental and theoretical investigations physico-chemical basic principles of synthesis of nanocomposite materials in vacuum - plasma installations on the basis of high-current gas discharges with the automated computer systems for control of technological processes in real time for development of production methods of nanocomposite structures with given properties. The object of investigation is the methods of production of dense plasma of working substances in high-current magnetron, arc and plasma - beam gas discharges, methods of formation and acceleration of charged particle fluxes toward processed surface, methods of diagnostics and sensors of system of automation to control the parameters of technological plasma medium. The experiments on ion-plasma selective etching of materials surface with utilization of developed planar plasma source and cylindrical ion source based on surface waves were carried out. In particular, low-energy etching of thin films (Si, W, SiO2 and diamond-like carbon) in the medium of inert (Ar), chemically-active (O2, SF6) and their mixtures were made. The effect of pressure, discharge power, ion energy and gas composition on the rate and selectivity of etching were studied. The experiments on plasma-enhanced chemical-vapor and ion beam deposition of thin films (SiO2 and diamond-like carbon) with utilization of developed plasma sources were carried out. The cyclohexane (C6H12) and hexamethyldisiloxane (HMDSO) and their mixtures with oxidation (O2) and reduction (H2) additives were used. The carried out investigations show that changing composition of working mixtures and conditions of energy activation of the film formation (accelerating energy of ions, hf and dc bias) it is possible to produce the films with wide property range. The most important factor that determines the structure of the films is composition of plasma forming mixture. The second important factor is plasma parameters and energy of particles. A method of ion beam polishing with utilization of a cylindrical ion source based on surface waves was developed. The features of the method consist of (i) preliminary ion beam assisted deposition of 100 nanometer-thick layer of diamond-like carbon film over a rough surface so that the top surface of the initial substrate is planar; (ii) sputtering of the resulting surface structure by a normally incident low-energy argon-oxygen ion beam to a depth reaching approximately several layers of the deposited material; and (iii) several deposition-sputtering cycles until the necessary final state of the surface will be achieved. The engineering-physics bases of making of new generation of high-performance microcontroller multifunctional and multichannel automized control system for the vacuum-process equipment are designed. The experimental model of a control system with utilization of modern microelectronic technique and software are manufactured. Its investigation, calibration and checkout in actual requirements of laboratory measuring is carriedout. Product Description popup.authors popup.nrat_date 2020-04-02 Close