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Information × Registration Number 0308U001419, 0106U001574 , R & D reports Title Research of processes of formation of streams of the activated particles inclaster plasma systems for synthesis and processing of nanostructure popup.stage_title Дослідження параметрів комбінованих потоків активованих частинок у кластерній системі, умов зародження новоутворень на поверхні, що обробляється Head Farenik Volodimir Ivanovich, Registration Date 04-02-2008 Organization Kharkov national university named after V.N. Karazin popup.description2 Object of the research: new cluster system for reactive synthesis of complex composite compounds of oxide and oxynitride type on the basis of magnetron and RF inductive discharges. Purpose of the research: consists in separation of two processes:sputtering of a metal target by means of DC magnetron in noble gas medium and activation of reactive gas by additional ICP source, definition of the growth mechanism of newborns on solid surface under activity of the activated plasma particles. Research technique: Langmuir probe research of plasma, theoretical description of newborn formation. In the present report the results of development and research of new cluster system for reactive synthesis of complex composite compounds of oxide and oxynitride type on the basis of magnetron and RF inductive discharges are presented. The basic idea of technology consists in separation of sputtering process of metal target by means of DC magnetron in noble gas medium and activation of reactive gas by additional ICP source. The following problems have been solved in the research: two types ICP sources have been developed and explored for activation of chemically-active gases, URM3 installation has been modernized for reactive magnetron deposition of nanocomposite dielectric coatings, complex research of processes of reactive synthesis of the dielectric alumina coatings has been carried out. In the report the theoretical model of origin and initial stages of evolution of the micrometer size newborns on the cathode surface is presented which is based on the experimental data analysis. The equation of the surface profile evolution considering both sputtering and condensation on the surface of the secondary ionized particles of the target material have been gained. Product Description popup.authors popup.nrat_date 2020-04-02 Close