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Information × Registration Number 2112U001562, Article popup.category Thesis Title popup.author popup.publication 01-01-2012 popup.source_user Сумський державний університет popup.source http://essuir.sumdu.edu.ua/handle/123456789/35407 popup.publisher Sumy State University Description The paper describes the design, modes and applications of novel kind of low pressure plasma processing reactor based on beam plasma discharge as the plasma source. This reactor ensures flawless treatment of material surface as well as deposition of specific coatings with strictly defined energy of ions acting upon a treated surface. Applications of the reactor are represented such as defect-free etching heterostructures based on GaAs and producing structurally perfect samples of graphene. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35407 popup.nrat_date 2025-05-12 Close