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Information × Registration Number 2112U001655, Article popup.category Thesis Title popup.author popup.publication 01-01-2012 popup.source_user Сумський державний університет popup.source http://essuir.sumdu.edu.ua/handle/123456789/35088 popup.publisher Sumy State University Description The paper describes the fabrication process of templates with high aspect ratio suitable for formation of nanomposites with enhanced anisotropy. The templates are thick ordered porous silicon layers formed with the pulsed galvanostatic mode. Characteristic feature of the developed mode is a short reversed polarity pulse of certain amplitude. In the present paper the achieved thickness of porous silicon templates is 50 m with pore diameter 80 nm. The aspect ratio of those structures 1:600. The maximum thickness of formed silicon layers is not principally limited allowing obtaining nanostructures with even higher aspect ratio. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35088 popup.nrat_date 2025-05-12 Close