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Information × Registration Number 2112U001348, Article popup.category Thesis Title popup.author popup.publication 01-01-2012 popup.source_user Сумський державний університет popup.source http://essuir.sumdu.edu.ua/handle/123456789/35388 popup.publisher Sumy State University Description The amorphous carbon films were deposited on silicon-metal substrates by plasma jet chemical vapor deposition (PJCVD) and plasma enchanted CVD (PECVD). PJCVD carbon coatings have been prepared at atmospheric pressure in Ar/ C2H2 and Ar/H2/C2H2 mixtures. The films prepared in Ar/C2H2 plasma are attributed to graphite-like carbon films. Addition of the hydrogen decreases growth rate and the surface roughness of the coatings, but coatings have low fraction of oxygen (~5 at.%) The formation of the nanocrystalline graphite was obtained in Ar/H2/C2H2 plasma. The carbon nanotubes were synthesed by PECVD using Au/Cr catalyst particles at low (≤ 450 C; p = 40 Pa ) temperature in pure acetylene. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/35388 popup.nrat_date 2025-05-12 Close