Registration Number
0210U000738,
0109U000569
, R & D reports
Title
The establishing of the correlation between the film structure elements and the surface temperature arising during its deposition by magnetron sputtering
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Head
Shaginyan Leonid Robertovich,
Registration Date
19-03-2010
Organization
I.N.Frantsevich Institute for Probmens of Materials Sciences Ukrainian Academy of Science
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The structure of Cr, Ti, Mo films has been studied using electron microscopy and electron diffraction methods. It is proved that the film structure gradient developed along its thickness is a result of a steep surface temperature rise during the film formation. It is also shown that the film structure is a function of the flux of energy delivering at the condensation surface during the film growth. The model of the film structure as a function of the two deposition parameters - normalized surface temperature and the flux of energy at the condensation surface is suggested. The model allows the prediction of the possible type of the film structure.
Product Description
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Даниленко М.І.
Куліковський В. Ю.
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2020-04-02
