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Head: Indutnyi Ivan . Development of interferential nanolithography methods for formation of relief-phase structures by using of vacuum photoresists" 5 stage -"Investigation and development of solid-immersion photolithography based on chalcogenide photoresist. Preparation of the final report.
V. Lashkaryov Institute of semiconductor physics. № 0114U001616
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Updated: 2026-03-21
