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Information × Registration Number 0201U001180, 0198U000951 , R & D reports Title The investigation the solid-state reactions of the silicides formation into bimetalic thin film systemsTi- W, Ti-Co on Si. popup.stage_title Head Makogon Yu.M., Registration Date 22-01-2001 Organization National Technical University of Ukraine "Kiev Polytechnic Institute", Mechanical Building Institute, chair Resistance of Materials popup.description2 The regularities of phase formation, structure and properties of thin silicide films Ti- W, Ti-Co and Al-Ti-W on Si were investigated by methods of X-ray difraction, Auger- electron spectroscopy , second ion mass-spectrometry, resistometry. Rapid heat treatment was proposed insted of the traditional heat treatment in conditions of surfase annealing at 1170 K of system Al-Ti- W on Si allous to obtane the complicated silicide (Ti3W5)Si10, which is the effective barier for interdiffusion of Al and Si, what increases thermostability of the film system till 700 K. In the films of system Ti-Co/Si is showed principle possibility of epitaxy layers formation of cobalt disilicide by creation of additional diffusional membrane, which controls the interdiffusion rate of Co and Si and creates the condition for optimum growth of CoSi2 and formation of epitaxy layer with the best electrical and physical properties and stable exploitation characteristics. Product Description popup.authors popup.nrat_date 2020-04-02 Close