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Information × Registration Number 0203U006893, 0102U003396 , R & D reports Title Low-Ohmic Resistors from sputtered Targets of chromium-resisted Alloys with Low Doping content popup.stage_title Head Butilenko, Registration Date 01-10-2003 Organization Institute for Magnetism of NASU popup.description2 Conditions of resistive effect appearance in the thin films of anti ferromagnetic alloys on base of Chromium with d-transition elements are studied.The best of them, Chromium Resistive Alloys, CRA, are determined. The semindustrial technology to prepare the sputtered targets of CRA is well-proven. Together with JSC "Resourse-Resistor",Russia, we coordinated the chemiecal composition and electrophysical properties of cast CRA targets with the demands of the resistor industry technology. As a result we created the basic technology of serial production for the new genaration of low-resistors C2-33н rated 3,0-0,1 Ohm and TCR=+-100 10-6k-1.5635 Product Description popup.authors popup.nrat_date 2020-04-02 Close