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Information × Registration Number 0210U001491, 0109U005592 , R & D reports Title Vacuum-plasma module for the technological complex of making of nanoelectronics and microenergy element base popup.stage_title Head Rudenko Eduard, Registration Date 22-02-2010 Organization Institute for metal physics NAS Ukkraine popup.description2 A research object is the processes of pretsiziynogo size digestion with the use of sources of plasma on the basis of the induction VCh digit in the magnetic field (geliconni sources) and capacity electrode VCh digit with the transversal magnetic field (The VCh source magnetronne). The purpose of work is development and making of the specialized technological vacuum setting - the vacuum-plasma module, intended for forming of element base of nanoэlectronici and topology of nanopriborov, termoemisiynih sources, elements of transformation of sun and thermal energy in electric one. As a result of implementation of project the created specialized technological setting of pretsiziynogo size digestion and multifunction ionic-plasma treatment is the vacuum-plasma module which is based on the dvorozryadniy system, that consists of source of high-selective plazmohimichnogo digestion source of vыsocoanizotropnogo reactive-ionic digestion. In setting by a source chemically active radicals a geliconniy digit serves, and source of high-intensive ionic stream with independently managed by density and energy - the capacity electrode VCh digit with the transversal magnetic field. Working frequency of the module - 13,56 Mhz. Such combination of sources of plasma in setting of pretsiziynogo digestion has not analogues and thanks to high density of plasma provides in 10 - 100 times greater speed of dissociation of molecular gases that intensity of ionic streams on functional good, than in traditional options on the basis of induction (ICP) digits (setting Plasmafab System 100 with the source of plasma ICP 380, firm OXFORD INSTRUMENTS (Great Britain). Sources of plasma of the vacuum-plasma module compatible after working pressure, provide simultaneous action on good of streams chemically active radical and ionic component with the independent adjusting of their parameters. Therefore only such system can zabezpecheti stability of technological process of pretsiziynogo digestion and high output of suitable wares. The vacuum-plasma module is the technological constituent (by the second module) of complex of making of element base of nanoэlectronici and microэnergetici, that functionally includes at itself the two module. The first module intended for the synthesis of nanostrouctourovanih functional layers, was created and inculcated within the framework of innovative project of NAN of Ukraine №23 in 2008. The use in the vacuum-plasma technological complex of visocoefectivnih geliconnih sources provides less energy consumption in 3-5 times, than in the known at the international market equipment. The vacuum technological equipment with such possibilities at the international market of highly technological products for today is absent. Keywords: geliconne source of plasma, capacity VCh source magnetronne of plasma, ionic-plasma technologies, vacuum-technological equipment, nano- and microelectronics. Product Description popup.authors Вірко В.Ф. Короташ І. В. Краковний А.О. Мірошніченко М.М. Носков В.Л. Осипов Л.С. Полоцький Д.Ю. Реут В.М. Самородіна І.О. Семенюк В.Ф. Семенюк Н.І. Слободян В.М. Супоровський О.Я. Шамрай К.П. Якименко О.І. popup.nrat_date 2020-04-02 Close