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Information × Registration Number 0212U002342, 0107U002663 , R & D reports Title Investigation of fundamental properties of plasma of gas discharges used in modern technologies. popup.stage_title Head Protsenko I.M., Registration Date 09-02-2012 Organization Institute of physics NASU popup.description2 Purpose of scientific research efforts consisted in complex experimental and theoretical studies of physical properties of plasmas of gas discharges and beam-plasma systems for improvement of existing technological applications and development of the new ones. Objects of the researches were the plasmas of the following gas discharges at low and atmospheric pressures: discharge in crossed electric and magnetic fields with anode layer and confined electron drift, cylindrical discharge of magnetron type, glow discharge with hollow cathode, discharge on a mixture of He, Xe and iodine vapor, volume barrier discharge, discharge with liquid wall on a mixture of air and vapors of water and ethanol. Methods of atomic force microscopy, emission and absorption optical spectroscopy, x-ray photoelectronic spectroscopy, probe technique and measurements of electrophysical characteristics were used for the researches. Possibility of the use of etching and sputtering plasma accelerators based on the discharge with anode layer and plasma flows from the barrier discharge for liquid crystal (LQ) alignment was studied. It is shown that the alignment technique based on the plasma-beam etching can be successfully used not only for nematic LQ, but as well can be extended for the use with other LQ classes, such as ferroelectric LQ, lyotropic LQ and reactive mesogens. It is demonstrated that the direction of LQ alignment by mentioned techniques is defined by competition of two factors - roughness anisotropy of etched surface and anisotropy of broken surface chemical bonds. The possibility of creation of aligning films by deposition of inorganic substances on the surface by means of low energy ion-plasma flow is also shown. LQ alignment on polymer substrates is realized by their combined treatment by means of flow of particles from atmospheric barrier discharge and rubbing technique. It is shown that immersion implantation treatment of radiation detector based on Ті - LiTaO3 sandwich structures by means of argon ions with 5-20 keV energy and up to 2 1016 ion/cm2 dose results in increase of the structure strength with respect to laser radiation with = 1064 nm by a factor of 2.5. It is also determined that the implantation of Ar+ ions enables increase of the detector sensitivity in ultraviolet range of the radiation by a factor of 1.5 -2. Regularities of intensity variations of the emission lines of titanium, argon and reactive gas (О2 or N2) in the process of TiN and TiO2 film synthesis by cylindrical magnetron plasma are determined. On a basis of obtained results the new method of optical contactless realtime monitoring of the process of synthesis of such films is proposed. Plasma-chemical and kinetic processes in the discharges on He, Xe, I2 mixtures are researched. It is found that UV radiation lamps based on the use of such discharges possess higher efficiency coefficient and an order of magnitude longer lifetime, as compared with the lamps operating on common gas mixtures. Studies of the processes in plasma-chemical reactor based on glow discharge with liquid electrode on a mixture of air and vapors of water and ethanol have demonstrated its promise for enrichment of output mixture of the reactor by molecular hydrogen. It is shown that maximum hydrogen outcome occurs at approximately equal concentrations of water and ethanol in the discharge mixture. Product Description popup.authors Баженов Володимир Юрійович Гончаров Олексій Антонович Добровольський Андрій Миколайович Леваш Леонід Васильович Проценко Іван Макарович Птушинський Юрій Григорович Самойлов Володимир Борисович Стеценко Борис Володимирович Ціолко В'ячеслав Володимирович Щедрін Анатолій Іванович Ярощук Олег Васильович popup.nrat_date 2020-04-02 Close