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Information × Registration Number 0222U004805, 0117U002458 , R & D reports Title Development of the wear resistant coatings based on the system Al(Mg)-B-Si-C-Nfor long term use popup.stage_title Head Ivaschenko Volodimir Ivanovich, Доктор фізико-математичних наук Registration Date 03-11-2022 Organization Institute of Problems of Materials Science named after IM Frantsevich of the National Academy of Sciences of Ukraine popup.description2 The object of research - coatings, films and bulk materials based on the system Al(Mg)-B-Si-C-N, their production technology, structure and properties. The purpose of the study: 1) Based on experimental and theoretical studies, to find the optimal regimes of deposition of magnetron coatings and plasma chemical films based on Al(Mg)-B-Si-CN system for use as protective and wear-resistant layers and in semiconductor devices for long-term operation; 2) To establish the mechanisms of formation of structural, optoelectronic and mechanical properties of deposited coatings and films. Research methods: technological equipment, measuring apparatus, first-principles procedures. Amorphous SiCN:H films showed bright photoemission in the range 450-600 nm, energy gap in the range of 2-4 eV, conductivity of about 10-7 - 10-10 ohm-1cm-1, hardness over 24 GPa, high thermal stability (above 1100 0C), low roughness (0.33 nm) and coefficient of friction (<0.1). Amorphous coatings SiCN, BCN, SiBCN and AlN/ BCN were obtained by magnetron sputtering targets of SiC, B4C, Si + B4C and Al and B4C, respectively, in an Ar-N2 atmosphere; amorphous and nanostructured coatings AlMgBC, AlB2, AlBC, AlBSiC - by sputtering targets of AlMgB14 and C; AlB2; AlB2 and C; AlB2 and SiC, respectively, in an Ar atmosphere. The coatings are thermostable (up to 1200 0C), showed semiconductor properties, high hardness (17-28 GPa), low roughness (up to 0.5-2 nm), low coefficient of friction (0.1-0.2), good adhesion. First-principles calculations of amorphous SiCN, AlMgBC, AlN, AlB2, AlBC, AlBN allowed to study the structure of these phases and its influence on the properties (electron and phonon structure, elastic modules, hardness, fracture toughness, Debye temperature, stress-strain curves, etc.). The developed films and coatings are recommended for use as protective and wear-resistant layers in MEMS, NEMS and in semiconductor devices (solar cells, photodetectors, photodiodes). Product Description popup.authors Ivashchenko Volodymyr I. Ivashchenko Liudmyla A. Bykov Oleksandr I. Vasylkivska Maryna A. Granko Vasyl M. Kovalchenko Andriy M. Kozak Andriy O. Korychev Sergiy F. Marchuk Oleksandr K. Olifan Olena I. Onopriyenko Oleksiy O. Osadcha Ala V. Porada Oleksandr K. Synelnychenko Oleksiy K. Sytikov Oleksandr O. Skrynsky Petro L. Shevchenko Volodymyr I. Shevchenko Roman V. popup.nrat_date 2022-11-03 Close