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Інформація × Реєстраційний номер 2111U001317, Матеріали видань та локальних репозитаріїв Категорія Thesis Назва роботи DLC deposition by PECVD at plasma cathode based low-pressure discharge Автор Дата публікації 01-01-2011 Постачальник інформації Сумський державний університет Першоджерело http://essuir.sumdu.edu.ua/handle/123456789/20765 Видання Видавництво СумДУ Опис The characteristics of coatings prepared by acetylene decomposition in nonself-sustained discharge with a plasma cathode have been studied. The initial energy of electrons injected into the plasma was 0,1 – 0,7 keV, energy of ions bombarding the coating was 0,1 – 0,7 keV and the pressure of Ar + C2H2 gas mixture was 0,2 – 1 Pa. Microhardness and wear resistance of coatings were measured by methods of kinetic indentation and ball abrasion. The coatings with high microhardness (40 – 60 GPa) and high wear resistance were deposited on conditions that ion energy exceeded 300 eV. It was shown that coating’s microhardness and internal stresses in the coatings deposited on chamber walls could be reduced by concerted change of voltage accelerating injected electrons and bias voltage applied to samples placed into the plasma. This allows to avoid delamination of coating particles from the walls and to provide high quality coating on samples. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/20765 Додано в НРАТ 2025-05-12 Закрити