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Інформація × Реєстраційний номер 2114U001535, Матеріали видань та локальних репозитаріїв Категорія Стаття Назва роботи High Temperature Annealing of Ion-Plasma Nanostructured Coatings Based on AlN-TiB2(TiSi2) Автор Дата публікації 01-01-2014 Постачальник інформації Сумський державний університет Першоджерело http://essuir.sumdu.edu.ua/handle/123456789/38065 Видання Polish Academy of Sciences Institute of Physics Опис The coatings investigated in this paper were deposited via the magnetron sputtering of AlN-TiB2(TiSi2) target in Ar atmosphere. The investigation of structural-phase composition, element composition, morphology and mechanical properties before and after annealing up to 1350 C was carried out. The concentration of elements in the coating was changed after annealing at 900 C and further annealing at 1350 C (especially after annealing at 1350 C). The hardness of as-deposited coatings was 15 GPa, but after annealing at 1350 C the value of hardness increased up to 22 - 23,5 GPa. The value of the viscoplastic index was 0.07. All this provide high damping properties of the coating, and amorphous-like structure makes promising the use of these coatings as diffusion barriers in the form of independent elements, and as a contacting layer in multilayer wear resistant coatings. Додано в НРАТ 2025-05-12 Закрити