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Information × Registration Number 2116U002040, Article popup.category Стаття Title popup.author popup.publication 01-01-2016 popup.source_user Сумський державний університет popup.source http://essuir.sumdu.edu.ua/handle/123456789/46987 popup.publisher Elsevier Description In the present work, multifunctional Ti-Si-N coatings have been deposited using CAVD method with the aim of studying their chemical, physical, structural and mechanical properties. Coatings of Ti-Si-N were modified by high-intensity ion implantation using copper ions with dose D = 2 × 1017 ions/cm2 and energy E = 60 keV. The results demonstrated that ion implantation has an effect on the grain size, hardness, and Young modulus of the Ti-Si-N coating. Additionally, the effect of Cu implantation on the bioactive properties of coatings was investigated by contact antimicrobial essay. The results show a high release of Cu ions in the cultivation liquid and the low efficiency of the b20% Cu doping towards E. coli bacteria. Our results bring understanding to the low dosage ion implantation of multifunctional surfaces towards applications and general drawbacks of ion implantation as bioactive tailoring method. popup.nrat_date 2025-05-12 Close