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Інформація × Реєстраційний номер 2116U002040, Матеріали видань та локальних репозитаріїв Категорія Стаття Назва роботи Effect of ion implantation on the physical and mechanical properties of Ti-Si-N multifunctional coatings for biomedical applications Автор Дата публікації 01-01-2016 Постачальник інформації Сумський державний університет Першоджерело http://essuir.sumdu.edu.ua/handle/123456789/46987 Видання Elsevier Опис In the present work, multifunctional Ti-Si-N coatings have been deposited using CAVD method with the aim of studying their chemical, physical, structural and mechanical properties. Coatings of Ti-Si-N were modified by high-intensity ion implantation using copper ions with dose D = 2 × 1017 ions/cm2 and energy E = 60 keV. The results demonstrated that ion implantation has an effect on the grain size, hardness, and Young modulus of the Ti-Si-N coating. Additionally, the effect of Cu implantation on the bioactive properties of coatings was investigated by contact antimicrobial essay. The results show a high release of Cu ions in the cultivation liquid and the low efficiency of the b20% Cu doping towards E. coli bacteria. Our results bring understanding to the low dosage ion implantation of multifunctional surfaces towards applications and general drawbacks of ion implantation as bioactive tailoring method. Додано в НРАТ 2025-05-12 Закрити